International Symposium Identifies Top Issues for sub-40 nm Immersion Litho

Oct 17, 2006

Bolstered by evidence that 193 nm immersion (193i) lithography is here to stay, semiconductor technology leaders have identified the top five critical issues for extending the breakthrough imaging process toward the 32 nm technology generation.

Meeting here recently at the 3rd International Symposium on Immersion Lithography—sponsored by Selete and SEMATECH in cooperation with IMEC—nearly 400 technologists heard presentations showing that 193i is on track for volume manufacturing at sub-65 nm half-pitch, and might be extensible below 40 nm half-pitch with techniques using high refractive index fluids and very high numerical aperture (NA).

In response, the Symposium’s steering committee established the following key challenges for utilizing 193i below 40 nm half-pitch:

1. Development of high-index lens materials
2. Identification of high-index refractive fluids
3. Availability of effective photoresists (including leaching & high index resists)
4. Cost-effective development of double exposure patterning
5. Attainment of low defectivity

“A path forward to half-pitch imaging below 40 nm has been clearly identified—but our ability to get there will depend on how much progress we make in solving these critical issues,” said Michael Lercel, SEMATECH’s Lithography director. “We’ll need to make strategic decisions on high-index materials, double patterning and double exposure to understand the ultimate extensibility of the technology into high-volume manufacturing.”

Key presentations during the Symposium focused on hyper-NA, resists, exposure tools, optical materials, process, photomasks, immersion defects, and alternative immersion fluids. More than 20 percent of submitted papers dealt with immersion defects, revealing the industry’s momentum in preparing 193i for volume manufacturing at sub-65 nm half-pitch. Interest in extending the technology below 40 nm half-pitch was demonstrated by a comparable number of submissions on high-index fluids. Also, many participants appeared convinced that 193i technology could reach and possibly exceed 1.55 NA.

The Symposium was organized by Selete and SEMATECH in cooperation with IMEC. SEMATECH will organize a fourth international Symposium, aimed at accelerating decisions related to the identified critical issues, in October 2007 in the United States.

Explore further: Improvements in transistors will make flexible plastic computers a reality

add to favorites email to friend print save as pdf

Related Stories

Aircraft with a parallel hybrid engine tested in UK

2 hours ago

More research is needed before commercial airliners will be powered entirely with electric motors but tests with hybrid designs are turning up interesting results. Researchers from the University of Cambridge ...

Recommended for you

Google's Waze app endangers police: LAPD chief

51 minutes ago

Google's newly acquired Waze application poses a danger to police because of its ability to track their locations, the Los Angeles police chief said in a letter to the tech company's CEO.

Aircraft with a parallel hybrid engine tested in UK

10 hours ago

More research is needed before commercial airliners will be powered entirely with electric motors but tests with hybrid designs are turning up interesting results. Researchers from the University of Cambridge ...

Google wireless service could disrupt carriers

11 hours ago

Internet users from San Jose to Kansas City have been clamoring for Google to lay down its long-awaited fiber-optic network to compete with Comcast and AT&T in speeding up Web and television access. Now the Silicon Valley ...

User comments : 0

Please sign in to add a comment. Registration is free, and takes less than a minute. Read more

Click here to reset your password.
Sign in to get notified via email when new comments are made.