Imec and Synopsys expand FinFET collaboration to 10 nanometer geometry

Dec 12, 2012

Imec, the Belgian nanoelectronics research center, and Synopsys, Inc., a global leader accelerating innovation in the design, verification and manufacturing of chips and systems, today announced that they have expanded their collaboration in the field of Technology Computer Aided Design (TCAD) to next-generation FinFET technology at 10-nm. The collaboration builds on extensive work done at 14-nm and several other process geometries, and will calibrate Synopsys' Sentaurus TCAD models to support the next-generation FinFET devices. The collaboration will include 3-D modeling of new device architectures and materials that will enable the semiconductor industry to continue to deliver products with higher performance and lower power consumption.

"Our focus is to address and material challenges at 10 nanometers and beyond," said Aaron Thean, director of the logic program at imec, Inc. "Collaborating with Synopsys, the market and technology leader in TCAD, helps us maximize the impact and reach of our advanced research programs."

Imec is partnering with leading IC companies for research in advanced CMOS scaling. Device scaling beyond feature-size reduction requires research on a range of new technologies, including new materials, device architectures, 3-D integration, and photonics. The collaboration between imec and Synopsys specifically focuses on the development and optimization of new device architectures based on FinFETs and tunnel FETs (TFETs). At this week's IEEE International Electron Devices Meeting (IEDM 2012, San Francisco, USA, December 8-10, 2012), imec presented a paper on the use of stressors to boost carrier mobility, which is critical to scale FinFET devices at 10-nm and beyond. Insights and understanding obtained through the usage of Synopsys' TCAD tools will allow imec to accelerate this research.

"This expanded collaboration with imec enables us to extend Synopsys' industry-¬leading TCAD for next-generation FinFET device modeling and development," said Howard Ko, general manager and senior vice president of the silicon engineering group at Synopsys. "Imec is recognized worldwide for its expertise, excellent research facilities and industry focus, and our partnership will help to further advance our TCAD solutions."

Explore further: Model-based highly efficient and highly reliable development process for digital controlled power supply units

add to favorites email to friend print save as pdf

Related Stories

IMEC advancing state-of-the-art in FinFETs

Jun 13, 2007

At this week’s VLSI Symposium, IMEC presents significant progress in the manufacturability, circuit performance and reliability of FinFETs. The results advance FinFET process technology towards being a candidate ...

Recommended for you

Drivebot aims to touch driver bases for safety, savings

4 hours ago

Five Thailand-based engineers have developed a dongle device that serves as a fitness tracker for cars and have turned to Indiegogo to raise funds for bringing it forward. The attraction is that it is a simple ...

HP announces Sprout—a truly innovative workstation

7 hours ago

Hewlett-Packard Co has announced the development of a new kind of computer workstation—one that combines the power of a desktop computer with 3D scanning and projection—and adds a second display surface ...

Q&A: 'Interstellar' filmmaker Nolan on his robots

7 hours ago

In his secrecy-shrouded sci-fi extravaganza "Interstellar," filmmaker Christopher Nolan isn't just taking audiences to outer space. He's also sending a couple of robots along for the ride—and they're just ...

User comments : 0

Please sign in to add a comment. Registration is free, and takes less than a minute. Read more

Click here to reset your password.
Sign in to get notified via email when new comments are made.