The semiconductor industry is faced with the challenge of supplying ever faster and more powerful chips. The Next-Generation Lithography with EUV radiation will help meeting that challenge. Fraunhofer researchers have developed ...
Electronics & Semiconductors
May 10, 2012
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Imec today announces that it has released an early-version PDK (process development kit) for 14nm logic chips. This PDK is the industry’s first to address the 14nm technology node. It targets the introduction of a number ...
Electronics & Semiconductors
Mar 7, 2012
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At next week’s SPIE Advanced Lithography conference (San Jose, CA), imec announces the successful implementation of the world first 300mm fab-compatible Directed Self-Assembly (DSA) process line all-under-one-roof in ...
Electronics & Semiconductors
Feb 10, 2012
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Imec and ASML collaborated to qualify ASML's Tachyon Source Mask Optimization and programmable illuminator system FlexRay, proving its potential with the demonstration of a 22nm SRAM memory cell.
Electronics & Semiconductors
Jul 14, 2010
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Toshiba and Japan's National Institute of Advanced Industrial Science and Technology (AIST) today announced joint development of a mask pattern optimizing technology that improves the accuracy of lithography for LSIs by approximately ...
Electronics & Semiconductors
Feb 15, 2010
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