Nano-electronics research center Imec and Nova Measuring Instruments, a leading innovator and key provider of metrology solutions for advanced process control used in semiconductor manufacturing, announced today at SPIE advanced ...
Electronics & Semiconductors
Feb 23, 2016
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In this video we see an electron gun made of many thousands of vertically aligned carbon nanotubes, each more than 1,000 times smaller than the width of a human hair. Dr Matt Cole, from the University of Cambridge, explains ...
Nanophysics
Jun 20, 2014
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Block copolymers (BCPs) are the most attractive alternative to date for the fabrication of well-defined complex periodic structures with length scales below 100 nm. Such small structures might be used in a wide range of technological ...
Nanophysics
May 30, 2014
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SEMATECH announced today that researchers have reported progress which could significantly improve resist sensitivity by incorporating metal oxide nanoparticles for extreme ultraviolet (EUV) lithography, bringing the technology ...
Electronics & Semiconductors
May 13, 2014
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The new features of this biomimetic material will allow us to develop multiple nanometer-sized chemical sensors over the same substrate by electron beam lithography, as a result, multifunctional biochips of major versatility ...
Nanophysics
Oct 3, 2013
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Researchers from the National Institute of Advanced Industrial Science and Technology (AIST), have developed a circuit-characteristics analysis system that can reflect the detailed shape of a circuit pattern (lithography ...
Electronics & Semiconductors
Jun 6, 2013
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Imec announces that it has designed and fabricated an electrostatic micro-lens (lenslet) array for KLA-Tencor's anticipated Reflective Electron Beam Lithography (REBL) tool. The REBL technology potentially enables a high ...
Electronics & Semiconductors
Nov 6, 2012
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Case Western Reserve University researchers have won a $1.2 million grant to develop technology for mass-producing flexible electronic devices at a whole new level of small.
Nanomaterials
Oct 16, 2012
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Imec and Tokyo Electron (TEL) announce that they will accelerate their Directed Self-Assembly (DSA) activities at imec's recent 300mm fab-compatible DSA process line. Over the past two years, both companies have been actively ...
Electronics & Semiconductors
Oct 8, 2012
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SEMATECH announced today that researchers have reached a significant milestone in reducing tool-generated defects from multi-layer deposition of mask blanks used for extreme ultraviolet lithography (EUVL), bringing that technology ...
Electronics & Semiconductors
Aug 14, 2012
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