SEMATECH achieves world-class defect reductions in EUV

SEMATECH announced today that researchers have reached a significant milestone in reducing tool-generated defects from multi-layer deposition of mask blanks used for extreme ultraviolet lithography (EUVL), bringing that technology ...

Helices of light: dark helices with a bright future

(Phys.org) -- Laser beams can be made to form dark as well as bright intensity helices, or corkscrews of light. In a paper shortly to appear in Optics Express, Dr Ole Steuernagel, at the University of Hertfordshire's Science ...

Performance boost for microchips

The semiconductor industry is faced with the challenge of supplying ever faster and more powerful chips. The Next-Generation Lithography with EUV radiation will help meeting that challenge. Fraunhofer researchers have developed ...

Researchers unlock mystery of how 'handedness' arises

The overwhelming majority of proteins and other functional molecules in our bodies display a striking molecular characteristic: They can exist in two distinct forms that are mirror images of each other, like your right hand ...

Process makes polymers truly plastic

Just as a chameleon changes its color to blend in with its environment, Duke University engineers have demonstrated for the first time that they can alter the texture of plastics on demand, for example, switching back and ...

3D-printer with nano-precision

Printing three dimensional objects with incredibly fine details is now possible using "two-photon lithography". With this technology, tiny structures on a nanometer scale can be fabricated. Researchers at the Vienna University ...

Imec releases industry’s first 14nm process development kit

Imec today announces that it has released an early-version PDK (process development kit) for 14nm logic chips. This PDK is the industry’s first to address the 14nm technology node. It targets the introduction of a number ...

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