Imec and ASML collaborated to qualify ASML's Tachyon Source Mask Optimization and programmable illuminator system FlexRay, proving its potential with the demonstration of a 22nm SRAM memory cell.
Electronics & Semiconductors
Jul 14, 2010
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(Phys.org) —ASML develops technology for high-tech lithography machines for the semiconductor industry. The company, based in The Netherlands, manufactures equipment that is used to transfer circuit patterns onto wafers. ...
Toshiba and Japan's National Institute of Advanced Industrial Science and Technology (AIST) today announced joint development of a mask pattern optimizing technology that improves the accuracy of lithography for LSIs by approximately ...
Electronics & Semiconductors
Feb 15, 2010
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Imec today announces the world-first realization of functional sub-100nm photonics components with optical lithography on 300mm silicon photonics wafer technology. Using 193nm immersion lithography, imec achieved the lowest ...
Electronics & Semiconductors
Jul 10, 2012
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The mass production of flat optical devices with sub-wavelength structures could soon be a reality, thanks to a metasurface fabrication technique developed by researchers at A*STAR.
Optics & Photonics
Mar 18, 2019
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14
Nano-electronics research center Imec and Nova Measuring Instruments, a leading innovator and key provider of metrology solutions for advanced process control used in semiconductor manufacturing, announced today at SPIE advanced ...
Electronics & Semiconductors
Feb 23, 2016
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