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Nanoparticles – while possessing some amazing properties of strength and power – are also delicate little things, when it comes to manipulating them for use in nanodevices. Many scientists consider that the most promising ...
Using a combination of experimental data and simulations, researchers have identified key parameters that predict the outcome of nanoimprint lithography, a fabrication technique that offers an alternative to traditional lithography ...
In the race to create the roll-up TV (and a host of other devices), scientists are continually manipulating organic light-emitting diode (OLED) technology. Recently, researchers from Korea have designed a technique that is ...
New data on the properties of potential "liquid lenses" compiled by the National Institute of Standards and Technology (NIST) could help the semiconductor industry continue to shrink feature sizes on computer chips.
A new computer chip lithography method under development at Rochester Institute of Technology has led to imaging capabilities beyond that previously thought possible.
Synopsys, Inc. and SEMATECH today announced a joint program to develop advanced optical proximity correction (OPC) models that will enable the extension of optical lithography.
Albany NanoTech, a leading global center for nanotechnology research, development and deployment, today announced the delivery of a new state of the art tool for extreme ultraviolet (EUV) lithography research, built by Energetiq ...
Cymer, Inc., the world's leading supplier of deep ultraviolet (DUV) light sources used in semiconductor manufacturing, today announced the integration of a Cymer XLA 105 argon fluoride (ArF) light source on a 0.85 numerical ...
Guided by input from more than 100 industry professionals, a SEMATECH-led steering committee has ranked the critical issues for bringing maskless lithography (ML2) from R&D concepts to limited commercial production, possibly ...
Findings Suggests Immersion is Nearly Ready For Production Taiwan Semiconductor Manufacturing Company, said that it used immersion lithography tools to produce fully functional 90nm devices. The finding was presented in ...
