Search results for catadioptric

General Physics Jul 09, 2019

MEMS-in-the-lens architecture for laser scanning microscopy

Laser-scanning microscopes can be miniaturized to image microenvironments in vivo via inclusion inside optical micromechanical system (MEMS) devices to replace the existing larger components. Multifunctional active optical ...

General Physics Nov 30, 2006

New wide-angle lens produces pictures without distortion

South Korean researchers have designed and built an inexpensive optical lens that collects light from a large area and produces a virtually distortion-free wide-angle image. Standing in contrast to commonly known "fisheye" ...

Engineering Dec 11, 2012

A new tool to enhance tasks of humanitarian demining

Researchers at the Centre for Automation and Robotics, a joint centre of the Universidad Politecnica de Madrid and the Spanish National Research Council (UPM-CSIC), have developed a training tool to improve the use of hand-held ...

Engineering Aug 06, 2010

Artificial bee eye gives insight into insects' visual world

Despite their tiny brains, bees have remarkable navigation capabilities based on their vision. Now scientists have recreated a light-weight imaging system mimicking a honeybee's field of view, which could change the way we ...

Dec 06, 2005

ASML Impacts Industry Roadmap with Immersion and EUV Achievements for 45 nm and Beyond

ASML Holding NV today announced significant progress towards development of both high NA immersion and Extreme Ultra Violet (EUV) lithography technology: two critical elements of the semiconductor industry’s ability to ...

Jul 13, 2005

ASML Introduces the Industry's Highest NA Immersion Tool for Volume Chip Production at 45 nm Node

ASML Holding NV (ASML) today announced a new lithography system with the highest numerical aperture (NA) – 1.2 – in the semiconductor industry. The ASML TWINSCAN XT:1700i system is a 193 nm immersion scanner capable of ...

Jul 07, 2004

SEMATECH and Exitech to Develop the World’s First Ultra High Numerical Aperture 193 nm Immersion Lithography Tool

Austin, Texas and Oxford, England (7 July 2004) -- International SEMATECH and Exitech have announced an agreement to develop the world’s first ultra high numerical aperture (NA = 1.3) 193 nm wavelength immersion lithography ...