TSMC Qualifies Applied Materials' Gate Stack System for Its Leading-Edge 65nm Transistor Processes

May 6, 2005

Applied Materials, Inc. announced today that Taiwan Semiconductor Manufacturing Co. (TSMC) has qualified the Applied Centura Gate Stack system with DPN (decoupled plasma nitridation) technology for all of its 65nm-generation transistor fabrication processes. This advanced technology enabled TSMC to achieve their 65nm equivalent oxide thickness (EOT) scaling targets while increasing device speed.

Dr. Mong-Song Liang, senior director, Advanced Modules Technology Division, R&D, of TSMC, said, "Applied's single-wafer gate stack system has played a significant role in TSMC's leadership in advanced transistor fabrication. The gate stack system with Applied's DPN technology has helped us scale our transistors and extend oxynitride gate dielectrics to the 65nm generation, for both high performance and low-power applications, with the productivity needed for volume production. By combining Applied Materials' hardware and process technology expertise with TSMC's integration and manufacturing know-how, we were able to accelerate the implementation of this advanced gate stack technology, demonstrating the value of our strong relationship with Applied."

The Applied Gate Stack system provides excellent film interface control by integrating DPN, Radiance RTP, In Situ Steam Generation (ISSG) oxidation and polysilicon deposition processes on the Centura platform. TSMC already uses the 300mm Applied Centura Gate Stack system in its fabs, where its advanced single-wafer technology and multi-process integration capabilities have made it tool of record for transistor manufacturing. Unlike other gate oxynitride techniques, Applied's DPN technology uses an advanced plasma source to create a low-energy plasma, which results in precise nitrogen profile control.

"TSMC is a world leader in high-performance transistor fabrication, and we are delighted to contribute to their extension of oxynitride gate dielectric technology to 65nm," said Dr. Randhir Thakur, group vice president and general manager of Applied Materials' Front End Products group. "Our unique, fully integrated approach to gate stack fabrication provides optimum drive current and minimum gate leakage and allows additional generations of scaling over other technologies. The Gate Stack system is part of our suite of RunFastStayCool solutions for boosting device performance in next-generation transistors."

Explore further: Amazon's robots: Job destroyers or dance partners?

Related Stories

Amazon's robots: Job destroyers or dance partners?

August 16, 2017

Every day is graduation day at Amazon Robotics. Here's where the more than 100,000 orange robots that glide along the floors of various Amazon warehouses are made and taught their first steps.

Microsoft PowerShell team keen on added SSH support

June 5, 2015

Microsoft PowerShell is to benefit from adding OpenSSH support. Numerous tech sites ran news of the announcement from Microsoft this week. Technology Personalized told how Microsoft will now work toward better Windows SSH ...

Recommended for you

Mountain glaciers shrinking across the West

October 22, 2017

Until recently, glaciers in the United States have been measured in two ways: placing stakes in the snow, as federal scientists have done each year since 1957 at South Cascade Glacier in Washington state; or tracking glacier ...

When words, structured data are placed on single canvas

October 22, 2017

If "ugh" is your favorite word to describe entering, amending and correcting data on the rows and columns on spreadsheets you are not alone. Coda, a new name in the document business, feels it's time for a change. This is ...

Dawn mission extended at Ceres

October 20, 2017

NASA has authorized a second extension of the Dawn mission at Ceres, the largest object in the asteroid belt between Mars and Jupiter. During this extension, the spacecraft will descend to lower altitudes than ever before ...

Metacognition training boosts gen chem exam scores

October 20, 2017

It's a lesson in scholastic humility: You waltz into an exam, confident that you've got a good enough grip on the class material to swing an 80 percent or so, maybe a 90 if some of the questions go your way.

Carbon coating gives biochar its garden-greening power

October 20, 2017

For more than 100 years, biochar, a carbon-rich, charcoal-like substance made from oxygen-deprived plant or other organic matter, has both delighted and puzzled scientists. As a soil additive, biochar can store carbon and ...

0 comments

Please sign in to add a comment. Registration is free, and takes less than a minute. Read more

Click here to reset your password.
Sign in to get notified via email when new comments are made.