AMD Orders Applied Materials Systems to Equip 300mm Fab

Dec 16, 2004

Applied Materials, Inc. received orders from Advanced Micro Devices, Inc. (AMD) for 300mm equipment to manufacture its future advanced 65nm-generation 64-bit microprocessors. The orders cover a broad range of process technologies, including Applied's most advanced etch systems, as well as a comprehensive suite of metrology and inspection tools. The systems are scheduled to begin shipping to AMD's new 300mm Fab 36 in Dresden, Germany, in late calendar 2004.

"Our successful work with Applied Materials in Fab 30 forged a strong and collaborative relationship that will be invaluable as we move to 65nm production," said Gary Heerssen, senior vice president, corporate manufacturing, AMD. "Applied's breadth of 65nm-capable process and inspection technologies, combined with its extensive support capabilities, were key reasons for this major equipment technology purchase, which will help drive AMD forward for the next several years."

"We are very pleased by AMD's choice of Applied Materials to supply many of its critical etch, inspection and other leading process technologies as it moves 65nm chip manufacturing," noted Franz Janker, senior vice president, sales and marketing, Applied Materials. "With each new chip generation it gets harder to achieve top device performance with high yield and fast time to market. Applied's comprehensive product portfolio gives customers access to a depth of expertise that can help them reach their aggressive production goals with fewer problems, enhancing profitability."

AMD selected several types of etchers, including the company's latest Applied Centura(R) Enabler(R) and Producer(R) Dielectric Etch systems for etching advanced copper/low k interconnects. To obtain the highest level of process control, AMD chose the new high-throughput, high-resolution Applied VeritySEM(TM) Metrology CD-SEM, the Applied SEMVision(TM) FIB (focused ion beam) defect analysis system and the ComPlus(TM) wafer inspection system.

Applied Materials was selected as AMD's exclusive supplier of high current, low energy implant technology with its purchase of Applied Quantum(R) X Implant systems. Other technologies chosen for building 65nm transistors included Applied's gate stack and RTP (rapid thermal processing) systems. For dielectric CVD (chemical vapor deposition) applications, AMD purchased a large number of Applied Producer(R) systems to deposit a broad range of PECVD and low k films. A number of Applied Endura(R)2 PVD (physical vapor deposition) and Applied Reflexion(R) CMP (chemical mechanical polishing) systems were ordered for both transistor and copper interconnect applications.

Explore further: Large-surface light-emitting plastic film

add to favorites email to friend print save as pdf

Related Stories

Canada looks east-west to ship oil after Keystone veto

2 hours ago

After US President Barack Obama vetoed a bill to expedite construction of the Keystone XL pipeline Tuesday, petroleum producers are expected to turn to Canadian routes to ship oil internationally, but hurdles ...

Internet access limited in developing world

2 hours ago

Most people in the developing world do not use the Internet, with access limited by high costs, poor availability and a lack of relevant content, a Facebook report said Tuesday.

Manhattan Project physicist Ralph Nobles dies at 94

2 hours ago

(AP)—Ralph Nobles, a nuclear physicist who worked on the Manhattan Project and later led efforts to save thousands of acres of San Francisco Bay wetlands from development, died following complications of pneumonia, according ...

In Japan, robot dogs are for life - and death

2 hours ago

Incense smoke wafts through the cold air of the centuries-old Buddhist temple as a priest chants a sutra, praying for the peaceful transition of the souls of the departed.

US sees little severe weather so far in 2015

2 hours ago

(AP)—While a big chunk of the nation deals with snow and ice, the U.S. is poised to end January and February with the fewest bouts of severe weather in decades.

Recommended for you

Large-surface light-emitting plastic film

11 minutes ago

Based on OLED technology and implemented by means of a printing machine, this method developed by VTT Technical Research Centre of Finland Ltd provides an opportunity to create patterned and flexible light-emitting ...

Road safety through snowflake imaging

53 minutes ago

The technology behind the camera that revealed the intricate, imperfect beauty of snowflakes can now expose their potential danger.

User comments : 1

Adjust slider to filter visible comments by rank

Display comments: newest first

plasma_guy
not rated yet Jul 25, 2008
Intel has awarded Hitachi recently as its polysilicon gate etch supplier.

Please sign in to add a comment. Registration is free, and takes less than a minute. Read more

Click here to reset your password.
Sign in to get notified via email when new comments are made.