(PhysOrg.com) -- Laser interference lithography can produce very high-resolution nano-scale surface patterns at low cost, and now European researchers have made important breakthroughs in the area.
Nanophysics
May 7, 2010
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Toshiba Corporation today announced that it has developed a high resolution photoresist (photo-sensitive film) essential for future application of EUV (extreme ultraviolet) lithography in semiconductor fabrication, and proved ...
Electronics & Semiconductors
Nov 17, 2009
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Toys don't usually inspire high-tech innovation, but Michelle Khine's childhood favorite did just that.
Engineering
Sep 9, 2009
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With extremely short wavelengths and very high intensities, light-matter interaction seems to be different than previously accepted.
General Physics
Apr 24, 2009
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