Cymer partners with IMEC on immersion lithography

Jan 25, 2005

Cymer, Inc., the world's leading supplier of deep ultraviolet (DUV) light sources used in semiconductor manufacturing, today announced the integration of a Cymer XLA 105 argon fluoride (ArF) light source on a 0.85 numerical aperture (NA) immersion lithography tool at IMEC’s 300 mm wafer fab facility in Leuven, Belgium. The tool integration marks the first milestone in the company’s participation in IMEC’s Industrial Affiliation Program (IIAP) on Advanced Lithography - aimed at accelerating the adoption of immersion lithography process technology for next-generation (45nm and below) semiconductor applications. Acceptance of the tool will be completed later this month.

Commenting on this milestone, Bob Akins, Cymer's chairman and chief executive officer stated, "Cymer is dedicated to innovating lithography technologies that enable the world’s most advanced lithography processes. We are excited about the opportunity be a part of IMEC's IIAP to collectively ensure the availability of cost-effective immersion lithography process technology for industry adoption at the 45nm node. Integrating our XLA 105 into the 193nm immersion scanner at IMEC further validates the ability of our patented Master Oscillator Power Amplifier (MOPA) architecture to meet the exacting specifications of the industry’s emerging lithography technologies."

The XLA 105 is Cymer's second-generation, leading-edge, ArF light source to feature the production-proven, dual-chamber MOPA platform-providing lithography process engineers with the ultra line-narrowed and power requirements needed for today’s most advanced processes. Already widely adopted for leading-edge dry 193nm scanners, the XLA 105 enables the development of and manufacturing with the immersion lithography process. To date, all 193nm immersion scanners in the field use Cymer light sources.

Commenting on Cymer's participation in the IIAP on Advanced Lithography, Dr. Luc Van den hove, vice president of IMEC stated, "IMEC is pleased to welcome Cymer to the IIAP on Advanced Lithography. As a leading supplier of DUV light sources for semiconductor manufacturing, Cymer will provide tremendous technology expertise. With Cymer’s participation, the IIAP will investigate how light sources can be used to further enhance the latitude of the lithographic processes to extend Moore’s law."

Explore further: IBM posts lower 1Q earnings amid hardware slump

add to favorites email to friend print save as pdf

Related Stories

EUV machines to swing into commercial action in 2015

Aug 08, 2013

(Phys.org) —ASML develops technology for high-tech lithography machines for the semiconductor industry. The company, based in The Netherlands, manufactures equipment that is used to transfer circuit patterns ...

Engineer shrinks 'U' logo

Sep 17, 2010

In an example of how a technology wonk displays school spirit, an engineer has created a golden University of Utah logo that is smaller than the width of an average human hair.

Recommended for you

Net neutrality balancing act

1 hour ago

Researchers in Italy, writing in the International Journal of Technology, Policy and Management have demonstrated that net neutrality benefits content creator and consumers without compromising provider innovation nor pr ...

User comments : 0

More news stories

Net neutrality balancing act

Researchers in Italy, writing in the International Journal of Technology, Policy and Management have demonstrated that net neutrality benefits content creator and consumers without compromising provider innovation nor pr ...

Cosmologists weigh cosmic filaments and voids

(Phys.org) —Cosmologists have established that much of the stuff of the universe is made of dark matter, a mysterious, invisible substance that can't be directly detected but which exerts a gravitational ...

Bionic ankle 'emulates nature'

These days, Hugh Herr, an associate professor of media arts and sciences at MIT, gets about 100 emails daily from people across the world interested in his bionic limbs.