ARCNL is a public-private partnership between NWO (Dutch Research Council), University of Amsterdam, VU Amsterdam and the company ASML. ARCNL combines the best of both worlds: the scientific strength of NWO and its university partners with the application-oriented, demand-side management of the private party ASML. ARCNL focuses on the fundamental physics and chemistry behind current and future technology for nanolithography, especially for application in the semiconductor industry.
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Extreme ultraviolet light (EUV light) does not naturally occur on Earth, but it can be produced. In nanolithography machines, EUV light is generated using an immensely hot tin plasma. Researchers at ARCNL, in close collaboration ...
Plasma Physics
May 11, 2020
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Extreme Ultraviolet (EUV) light in microscopy offers the advantage of obtaining a high-resolution image combined with spectral information about the object under study. However, because EUV microscopy uses diffraction instead ...
Optics & Photonics
Jan 25, 2021
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Researchers at ARCNL have found a way to detect nanostructures buried under many layers of opaque material using high-frequency sound waves induced by light. Their findings could have applications in the semiconductor manufacturing ...
Nanophysics
Jul 8, 2020
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Researchers at ARCNL and Vrije Universiteit Amsterdam have developed a compact setup for fast, super-resolution microscopy through an ultrathin fiber. Using smart signal processing, they beat the theoretical limits of resolution ...
Optics & Photonics
May 8, 2020
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65
Controlling the properties of light is of great importance for many areas of physics, including imaging and nanolithography. But for short wavelengths, such as soft X-ray radiation, such control over the phase of light has ...
Optics & Photonics
Feb 18, 2020
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