Researchers at the National Institute of Advanced Industrial Science and Technology (AIST), have developed a microelectromechanical systems (MEMS) device fabrication technology that uses only printing and ...
Nov 21, 2012
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The recently developed ability to measure physical changes in silicon when processed into microelectronic devices could improve fabrication techniques for even smaller circuits.
Nov 07, 2012
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Plasma etching (using an ionized gas to carve tiny components on silicon wafers) has long enabled the perpetuation of Moore's Law -- the observation that the number of transistors that can be squeezed into an integrated circuit ...
Nov 10, 2011
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(PhysOrg.com) -- Graphene, a one-atom-thick layer of graphitic carbon, has great potential to make electronic devices such as radios, computers and phones faster and smaller. But its unique properties have also led to difficulties ...
Sep 03, 2010
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Semiconductor Research Corporation (SRC), University of Arizona and Arizona State University researchers have shown a new, exclusive way to dramatically conserve the amount of water needed to manufacture semiconductors. Using ...
Mar 10, 2010
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