News tagged with photomasks
SEMATECH Demonstrates Mask Pattern Alignment and Registration to Enable Double Patterning Lithography
SEMATECH and the Semiconductor Metrology Systems division from Carl Zeiss announced today that Zeiss' next-generation photomask registration and overlay metrology system has successfully passed a key development milestone. ...
Jul 30, 2010 |
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Search results for photomasks
Cell movement patterns
(PhysOrg.com) -- Whereas a cut knee often reduces children to tears, adults are more likely to be distressed by the fear of cancer. In both cases, that is wound healing and the growth and spread of tumours, ...
Mar 09, 2012 |
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A SHARP new microscope for the next generation of microchips
(PhysOrg.com) -- Moore’s Law, hardly a law but undeniably a persistent trend, says that every year and a half, the number of transistors that fit on a chip roughly doubles. It’s why electronics – ...
Oct 31, 2011 |
4 / 5 (1) |
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More precise method of nanopatterning
“A nanoimprint method has already been achieved in nanopatterning with a high resolution using negative type photoresist,” Kosei Ueno tells PhysOrg.com. Ueno is a scientist at Hokkaido University in Sapporo, Japan, ...
Aug 04, 2011 |
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Fab new laser nano-fabrication technology
(PhysOrg.com) -- Laser interference lithography can produce very high-resolution nano-scale surface patterns at low cost, and now European researchers have made important breakthroughs in the area.
May 07, 2010 |
4.8 / 5 (17) |
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Scientists build world's first nanofluidic device with complex 3-D surfaces
(PhysOrg.com) -- Researchers at the Commerce Department's National Institute of Standards and Technology (NIST) and Cornell University have capitalized on a process for manufacturing integrated circuits at ...
Nanotechnology / Bio & Medicine
Mar 31, 2009 |
4.8 / 5 (12) |
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IBM Develops Computational Scaling Solution for Next Generation '22nm' Semiconductors
In response to ever increasing demands for smaller, more powerful and energy-efficient devices for cloud computing and high-performance servers, IBM today announced the semiconductor industry's first computationally based ...
Sep 17, 2008 |
4.5 / 5 (18) |
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Exposing the Sensitivity of Extreme Ultraviolet Photoresists
Researchers at the National Institute of Standards and Technology (NIST) have confirmed that the photoresists used in next-generation semiconductor manufacturing processes now under development are twice as ...
Jun 26, 2008 |
3 / 5 (5) |
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Micro-origami: Researchers fold up micrometer-scale 'voxels' for drug delivery
Researchers at the USC Information Sciences Institute have demonstrated a way to manufacture miniscule closed containers that might be used to deliver precise micro- or even nano-quantities of drugs.
Apr 29, 2008 |
4.6 / 5 (5) |
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International Symposium Identifies Top Issues for sub-40 nm Immersion Litho
Bolstered by evidence that 193 nm immersion (193i) lithography is here to stay, semiconductor technology leaders have identified the top five critical issues for extending the breakthrough imaging process toward the 32 nm ...
Oct 17, 2006 |
2.7 / 5 (6) |
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Sematech Advances Feasibility of 193 nm Immersion Lithography for 45 nm
Sematech researchers have successfully used 193 nm immersion technology (193i) at 1.3 numerical aperture (NA) with azimuthal polarization to pattern features narrower than 45 nm half-pitch in multiple orientations simultaneously. ...
Oct 05, 2006 |
3 / 5 (2) |
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List of search results for photomasks
