News tagged with extreme ultraviolet lithography
Toshiba develops molecular photoresist technology for EUV lithography
Toshiba Corporation today announced that it has developed a high resolution photoresist (photo-sensitive film) essential for future application of EUV (extreme ultraviolet) lithography in semiconductor fabrication, ...
Nov 17, 2009 |
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Scientists Shed 'Light' on Semiconductor Quandry
(PhysOrg.com) -- UC San Diego scientists are using laser plasma-produced light sources to explore performance improvements of critical inspection tools for the semiconductor industry, which ultimately will ...
Jul 14, 2009 |
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Shaking the Fundamentals of Physics: At the Limits of the Photoelectric Effect
With extremely short wavelengths and very high intensities, light-matter interaction seems to be different than previously accepted.
Apr 24, 2009 |
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Search results for extreme ultraviolet lithography
Performance boost for microchips
The semiconductor industry is faced with the challenge of supplying ever faster and more powerful chips. The Next-Generation Lithography with EUV radiation will help meeting that challenge. Fraunhofer researchers ...
May 10, 2012 |
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Micropatterning Director at TSMC suggests e-beam lithography may replace EUV
(PhysOrg.com) -- Most integrated circuits today are made by using extreme ultraviolet (EUV) lithography technology, but that could change, according to Burn Lin, Micropatterning Director at Taiwan Semiconductor Manufacturing ...
Feb 23, 2012 |
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UV lithography: Taking extreme measures
(PhysOrg.com) -- Sometime soon, microchip fabricators will take the next major step in the relentless reduction of feature size, from the current minimum of 22 nm down to 10 nm and perhaps even smaller. Getting ...
Dec 09, 2011 |
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Plasma etching pushes the limits of a shrinking world
Plasma etching (using an ionized gas to carve tiny components on silicon wafers) has long enabled the perpetuation of Moore's Law -- the observation that the number of transistors that can be squeezed into an integrated circuit ...
Nov 10, 2011 |
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A SHARP new microscope for the next generation of microchips
(PhysOrg.com) -- Moore’s Law, hardly a law but undeniably a persistent trend, says that every year and a half, the number of transistors that fit on a chip roughly doubles. It’s why electronics – ...
Oct 31, 2011 |
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How to make e-beam lithography more practical as a mass-production technique
For 50 years, the transistors on computer chips have been getting smaller, and for 50 years, manufacturers have used the same technique -- photolithography — to make their chips. But the very wavelength ...
Jun 30, 2011 |
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UMD advance lights possible new path to creating next gen computer chips
(PhysOrg.com) -- University of Maryland researchers have made a breakthrough in the use of visible light for making tiny integrated circuits. Though their advance is probably at least a decade from commercial use, they say ...
Jan 31, 2011 |
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Ultra-thin solar blind EUV imager reported by Imec
Yesterday at the International Electron Devices Meeting in San Francisco imec presents an ultra-thin hybrid AlGaN-on-Si-based extreme ultraviolet (EUV) imager with only 10µm pixel-to-pixel pitch. The wide-bandgap material ...
Dec 08, 2010 |
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Faster, cheaper chips from space technology
(PhysOrg.com) -- Our world is full of integrated semiconductor circuits, commonly known as microchips. Today you find them in computers, cars, mobile phones and in almost every electrical device. Technology ...
Mar 26, 2010 |
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LLNL multilayer mirrors fly on NASA solar mission
(PhysOrg.com) -- A Lab technology that originally was developed to make computer chips smaller, faster and more powerful is now being used in space to take images of the sun every 10 seconds with 10 times ...
Space & Earth / Space Exploration
Mar 10, 2010 |
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List of search results for extreme ultraviolet lithography
