News tagged with exposure lithography
15,000 beams of light: Pens that write with light offer low-cost, rapid nanofabrication capabilities
(PhysOrg.com) -- One Chicago skyline is dazzling enough. Now imagine 15,000 of them.
Aug 01, 2010 |
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Search results for exposure lithography
Performance boost for microchips
The semiconductor industry is faced with the challenge of supplying ever faster and more powerful chips. The Next-Generation Lithography with EUV radiation will help meeting that challenge. Fraunhofer researchers ...
May 10, 2012 |
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New way to shape thin gel sheets proposed
Inspired by nature's ability to shape a petal, and building on simple techniques used in photolithography and printing, researchers at the University of Massachusetts Amherst have developed a new tool for ...
Mar 08, 2012 |
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New advance could lead to even smaller features in the constant quest for more compact, faster microchips
The microchip revolution has seen a steady shrinking of features on silicon chips, packing in more transistors and wires to boost chips’ speed and data capacity. But in recent years, the technologies behind these chips ...
Dec 14, 2011 |
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More precise method of nanopatterning
“A nanoimprint method has already been achieved in nanopatterning with a high resolution using negative type photoresist,” Kosei Ueno tells PhysOrg.com. Ueno is a scientist at Hokkaido University in Sapporo, Japan, ...
Aug 04, 2011 |
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How to make e-beam lithography more practical as a mass-production technique
For 50 years, the transistors on computer chips have been getting smaller, and for 50 years, manufacturers have used the same technique -- photolithography — to make their chips. But the very wavelength ...
Jun 30, 2011 |
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Apparent roadblock in the development of quantum lithography
(PhysOrg.com) -- Just when it began to appear that scientists had found a viable way around the problem of the blurring that occurs when using masks to create smaller and smaller silicon wafers for computer ...
May 20, 2011 |
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Sharpening the nanofocus: Researchers use nanoantenna to enhance plasmonic sensing
(PhysOrg.com) -- Such highly coveted technical capabilities as the observation of single catalytic processes in nanoreactors, or the optical detection of low concentrations of biochemical agents and gases ...
May 17, 2011 |
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UMD advance lights possible new path to creating next gen computer chips
(PhysOrg.com) -- University of Maryland researchers have made a breakthrough in the use of visible light for making tiny integrated circuits. Though their advance is probably at least a decade from commercial use, they say ...
Jan 31, 2011 |
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Researchers develop a full numerical model of EUV imaging and exposure statistics
The tolerances on feature size, shape, and placement for next generation computer chips fabricated with extreme ultra-violet (EUV) lithography will range from a maximum of a few nanometers down to less than 1 nm.
Jan 25, 2011 |
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Color-changing 'blast badge' detects exposure to explosive shock waves
Mimicking the reflective iridescence of a butterfly's wing, investigators at the University of Pennsylvania School of Medicine and School of Engineering and Applied Sciences have developed a color-changing ...
Medicine & Health / Neuroscience
Nov 29, 2010 |
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List of search results for exposure lithography
