News tagged with euv lithography
Imec releases industry’s first 14nm process development kit
Imec today announces that it has released an early-version PDK (process development kit) for 14nm logic chips. This PDK is the industry’s first to address the 14nm technology node. It targets the introduction of a number ...
Mar 07, 2012 |
3 / 5 (5) |
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Micropatterning Director at TSMC suggests e-beam lithography may replace EUV
(PhysOrg.com) -- Most integrated circuits today are made by using extreme ultraviolet (EUV) lithography technology, but that could change, according to Burn Lin, Micropatterning Director at Taiwan Semiconductor Manufacturing ...
Feb 23, 2012 |
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Shaking the Fundamentals of Physics: At the Limits of the Photoelectric Effect
With extremely short wavelengths and very high intensities, light-matter interaction seems to be different than previously accepted.
Apr 24, 2009 |
4.3 / 5 (24) |
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Search results for euv lithography
Performance boost for microchips
The semiconductor industry is faced with the challenge of supplying ever faster and more powerful chips. The Next-Generation Lithography with EUV radiation will help meeting that challenge. Fraunhofer researchers ...
May 10, 2012 |
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World's first 300mm-fab compatible directed self-assembly process line
At next week’s SPIE Advanced Lithography conference (San Jose, CA), imec announces the successful implementation of the world first 300mm fab-compatible Directed Self-Assembly (DSA) process line all-under-one-roof ...
Feb 10, 2012 |
4 / 5 (1) |
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UV lithography: Taking extreme measures
(PhysOrg.com) -- Sometime soon, microchip fabricators will take the next major step in the relentless reduction of feature size, from the current minimum of 22 nm down to 10 nm and perhaps even smaller. Getting ...
Dec 09, 2011 |
5 / 5 (6) |
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Plasma etching pushes the limits of a shrinking world
Plasma etching (using an ionized gas to carve tiny components on silicon wafers) has long enabled the perpetuation of Moore's Law -- the observation that the number of transistors that can be squeezed into an integrated circuit ...
Nov 10, 2011 |
4 / 5 (1) |
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A SHARP new microscope for the next generation of microchips
(PhysOrg.com) -- Moore’s Law, hardly a law but undeniably a persistent trend, says that every year and a half, the number of transistors that fit on a chip roughly doubles. It’s why electronics – ...
Oct 31, 2011 |
4 / 5 (1) |
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Researchers develop a full numerical model of EUV imaging and exposure statistics
The tolerances on feature size, shape, and placement for next generation computer chips fabricated with extreme ultra-violet (EUV) lithography will range from a maximum of a few nanometers down to less than 1 nm.
Jan 25, 2011 |
5 / 5 (2) |
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Ultra-thin solar blind EUV imager reported by Imec
Yesterday at the International Electron Devices Meeting in San Francisco imec presents an ultra-thin hybrid AlGaN-on-Si-based extreme ultraviolet (EUV) imager with only 10µm pixel-to-pixel pitch. The wide-bandgap material ...
Dec 08, 2010 |
5 / 5 (1) |
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SEMATECH Demonstrates Mask Pattern Alignment and Registration to Enable Double Patterning Lithography
SEMATECH and the Semiconductor Metrology Systems division from Carl Zeiss announced today that Zeiss' next-generation photomask registration and overlay metrology system has successfully passed a key development milestone. ...
Jul 30, 2010 |
4.8 / 5 (4) |
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Faster, cheaper chips from space technology
(PhysOrg.com) -- Our world is full of integrated semiconductor circuits, commonly known as microchips. Today you find them in computers, cars, mobile phones and in almost every electrical device. Technology ...
Mar 26, 2010 |
4 / 5 (11) |
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LLNL multilayer mirrors fly on NASA solar mission
(PhysOrg.com) -- A Lab technology that originally was developed to make computer chips smaller, faster and more powerful is now being used in space to take images of the sun every 10 seconds with 10 times ...
Space & Earth / Space Exploration
Mar 10, 2010 |
5 / 5 (4) |
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List of search results for euv lithography
