The ability to etch nanostructures onto the surface of diamond is expected to have a wide variety of potential applications, but so far etching and patterning diamond at the nanoscale has been challenging, as diamond is highly ...
Optical properties of materials are based on their chemistry and the inherent subwavelength architecture, although the latter remains to be characterized in depth. Photonic crystals and metamaterials have proven this by providing ...
Semiconductor nanocrystals of different sizes and shapes can govern the optical and electrical properties of materials. Liquid cell transmission electron microscopy (LCTEM) is an emerging method to observe nanoscale chemical ...
(Phys.org)—A team of researchers with Swinburne University of Technology in Australia has found a way to use two-beam super-resolution lithography to create 3D photonic "gyroid" nanostructures—similar to those found in ...
(Phys.org)—University of Illinois researchers have a new low-cost method to carve delicate features onto semiconductor wafers using light – and watch as it happens.
Nanophysics
Sep 28, 2012
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Plasma etching (using an ionized gas to carve tiny components on silicon wafers) has long enabled the perpetuation of Moore's Law -- the observation that the number of transistors that can be squeezed into an integrated circuit ...
Plasma Physics
Nov 10, 2011
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Around the world, specialists are working on implementing quantum information technologies. One important path involves light: Looking ahead, single light packages, also known as light quanta or photons, could transmit data ...
Optics & Photonics
Sep 20, 2022
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In modern telecommunications, light carries digital information over kilometers within seconds. Adapted optical materials control the light signals. In the Advanced Functional Materials journal, researchers from Berlin, Louvain, ...
Materials Science
Oct 5, 2012
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Researchers from the National Institute of Advanced Industrial Science and Technology (AIST) have found that when a metal thin film formed by electroless plating on a plastic substrate is irradiated for a very short time ...
Nanophysics
Jul 3, 2013
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Engineers in the CNST NanoFab have developed a new plasma etching technique for silicon which improves the etch rate, the mask selectivity, and the sidewall profile by optimizing the addition of argon to the process flow. ...
Nanophysics
Sep 29, 2011
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