Search results for PVD
Applied Materials Launches Breakthrough 45nm PVD Copper Barrier/Seed Technology
Applied Materials, Inc. today introduced the Applied Endura CuBS II, a breakthrough system that enables PVD copper barrier/seed deposition at 45nm and beyond. The system's new SIP EnCoRe II process chambers feature novel, ...
Dec 04, 2004 |
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Image: Pretty in pink
(PhysOrg.com) -- Inside the Plasma Spray-Physical Vapor Deposition, or PS-PVD, ceramic powder is introduced into the plasma flame, which vaporizes it and then condenses it to form the ceramic coating.
Apr 04, 2011 |
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Romantic partner may play role in reducing vulvovaginal pain
An investigation published in The Journal of Sexual Medicine has found that male partners who express greater support, attention and sympathy to women's chronic vulvovaginal pain may trigger more pain, but also increase sexual ...
Sep 09, 2010 |
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Clues to neuronal health found in tree-like nerve cell structures
Using the small, round worm C. elegans, researchers have discovered how elaborate dendritic trees (tree-like nerve structures) are formed and maintained. Possible applications include treatments for neurodegenerative diseases ...
Medicine & Health / Neuroscience
May 06, 2010 |
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Study looks at off-label use of biliary stents
Although approved by the U.S. Food and Drug Administration as a palliative treatment for cancer patients who have developed bile-duct obstructions, biliary stents are sometimes used “off-label” for the treatment of peripheral ...
Jan 21, 2008 |
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IMEC increases performance of high-k metal gate planar CMOS and FinFETs
At today’s IEEE International Electron Devices Meeting, IMEC reports significant progress in improving the performance of planar CMOS using hafnium-based high-k dielectrics and tantalum-carbide metal gates ...
Dec 11, 2007 |
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Applied Materials, IMEC Team to Develop Innovative 32nm, 22nm Interconnects
Applied Materials and IMEC, Europe's leading independent nanoelectronics and nanotechnology research center, announced today a significant joint effort to develop 32nm and 22nm-node copper/low k interconnect ...
Jan 24, 2006 |
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Applied Materials Announces Advanced CVD Aluminum Technology
Applied Materials, Inc. today announced its Applied CVD Al process chamber for building current and next-generation high-density interconnects in Flash and DRAM memory chips. Using aluminum deposition technology, which continues ...
Dec 06, 2005 |
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Applied Materials Announces Breakthrough in Interface Engineering Technology for 65-45nm Transistors
Applied Materials, Inc. today announced a key advancement in nano-scale interface engineering with its new Applied Siconi Preclean process for fabricating leading-edge transistor contacts.
Sep 20, 2005 |
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Tegal Awarded Key Patent For New Magnetron Sputter Source
New sputter source represents break through in target efficiency - provides significant cost savings to chip manufacturers Tegal Corporation announced that it has been granted United States Patent, No. 6,783,638 for the ...
Dec 20, 2004 |
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AMD Orders Applied Materials Systems to Equip 300mm Fab
Applied Materials, Inc. received orders from Advanced Micro Devices, Inc. (AMD) for 300mm equipment to manufacture its future advanced 65nm-generation 64-bit microprocessors. The orders cover a broad range of process technologies, ...
Dec 16, 2004 |
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STMicroelectronics Unveils Advanced Non-Volatile Memory and Advanced CMOS Platform Developments
STMicroelectronics, one of the world's leading suppliers of semiconductor devices, will participate as presenter or co-author in fifteen papers at the IEDM 2004 (International Electron Devices Meeting) Conference, which takes ...
Dec 10, 2004 |
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Scientists Formulate Intelligent Glass That Blocks Heat Not Light
Soaring air conditioning bills or suffering in the sweltering heat could soon be a thing of the past, thanks to UCL chemists. Reporting in the Journal of Materials Chemistry, researchers reveal they have developed an intellig ...
Physics /
Aug 10, 2004 |
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Samsung Develops 70-nanometer DRAM Process Technology
The industry’s first development of 70-nanometer DRAM process technology employing the CVD method Samsung Electronics announced that it has developed the industry’s first “CVD aluminum” process technology, the very latest ...
May 28, 2004 |
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