Applied Materials Launches Breakthrough Single-Wafer High-Current Quantum X Implanter

"The Quantum X system's breakthrough technology is its Stepscan(TM) single wafer implant processor that provides the process control to perform the most difficult and critical implants required for 65nm and 45nm logic and advanced DRAM manufacturing," said Craig Lowrie, vice president and general manager of Applied Materials' Implant division. "Leveraging our production-proven Quantum III beamline, the Quantum X's simple beam optics and short beamline enable faster beam tuning than any single-wafer system available today."
"For continued transistor scaling to 65nm and beyond, major innovations in ultra shallow junction process and manufacturing technology are critical," said Dr. Randhir Thakur, vice president and general manager of Applied Materials' Front End Products group. "By combining the Quantum X implanter with our established Applied Vantage(TM) RadiancePlus(TM) RTP spike anneal system, leading-edge customers now have the single-wafer process control necessary to enable unsurpassed junction uniformity and repeatability for optimal transistor performance in manufacturing."
Multiple Quantum X systems are already installed at a customer's site; additional orders have been received by logic and DRAM customers in the U.S., Europe and Asia.
The Applied Quantum X and Applied Vantage RadiancePlus RTP systems will be on display at SEMICON West on July 12-14 in San Francisco at Applied Materials' booth #1026. For more information on the Applied Quantum X implant system, please visit http://www.applied … cts/Quantum.

The original press release can be found here.