TSMC Verifies Fully Functional 90 Nanometer Chips Using Immersion Lithography Tools

Dec 22, 2004

Findings Suggests Immersion is Nearly Ready For Production

Taiwan Semiconductor Manufacturing Company, said that it used immersion lithography tools to produce fully functional 90nm devices. The finding was presented in a keynote speech at the Cymer Lithography Symposium in Semicon Japan on December 1, predating a similar announcement.
TSMC's circuits represent the first data that immersion-based lithography systems are nearing production-ready status.

Dr. Burn J. Lin, senior director of TSMC's micropatterning division, reported in the December keynote speech that TSMC had fabricated electrically functioning 90nm SRAM chips using a 90nm-node-capable prototype immersion scanner from ASML. The wafer batch was split at ASML for both immersion and dry exposures at critical layer before metal. After developing the resist image, the wafers were sent back to TSMC to complete the fabrication steps.

Yield, device characteristics and defect levels were comparable for both dry and wet scanners. The yield-related depth of focus of the immersion scanner is almost twice that of the dry scanner.

"While some optimization may still be in order, we have promising results pointing to immersion lithography systems and tools capable of producing functional deep-submicron devices that will scale well below the 90nm node," said Dr. Lin. "The larger focal range is the most significant finding, because it suggests that immersion tools can safely image with better yield than previously anticipated. This finding can be extrapolated to infer even greater benefits at the 65nm node."

TSMC estimates that immersion lithography tools may be called upon for 65nm production and are the chosen candidates for 45nm production. TSMC began installing its first 65nm immersion lithography system in early November this year.


Explore further: Ineda developing low power companion processors to increase battery life for wearables

add to favorites email to friend print save as pdf

Related Stories

IMEC reports major progress in EUV

Jul 14, 2008

IMEC reports functional 0.186µm2 32nm SRAM cells made with FinFETs from which the contact layer was successfully printed using ASML’s full field extreme ultraviolet (EUV) Alpha Demo Tool (ADT). Applied ...

IMEC advancing state-of-the-art in FinFETs

Jun 13, 2007

At this week’s VLSI Symposium, IMEC presents significant progress in the manufacturability, circuit performance and reliability of FinFETs. The results advance FinFET process technology towards being a candidate ...

Hynix joins IMEC's (sub-)32nm CMOS research platform

May 24, 2007

Hynix Semiconductor has entered into a strategic partnership with IMEC, Europe’s leading independent nanoelectronics research center, to perform research and development for the (sub)-32nm memory process generations.

Improved Materials Dominate Chip Evolution

Nov 03, 2005

Material innovation has replaced scaling as the primary source of performance and feature improvements in leading-edge CMOS semiconductors, IBM technologist Paul Farrar, Jr. told attendees at the ISMI Symposium on Manufacturing ...

Recommended for you

Visual search to shop: gimmick or game changing?

3 hours ago

Imagine using your phone to snap a photo of the cool pair of sunglasses your friend is wearing and instantly receiving a slew of information about the shades along with a link to order them.

WEF unveils 'crowdsourcing' push on how to run the Web

3 hours ago

The World Economic Forum unveiled a project on Thursday aimed at connecting governments, businesses, academia, technicians and civil society worldwide to brainstorm the best ways to govern the Internet.

Nigeria launches national identity card scheme

3 hours ago

Nigeria's President Goodluck Jonathan on Thursday launched a national electronic identity card scheme, which backers said would boost access to financial and government services in Africa's most populous nation.

SHORE facial analysis spots emotions on Google Glass

3 hours ago

One of the key concerns about facial recognition software has been over privacy. The very idea of having tracking mechanisms as part of an Internet-connected wearable would be likely to upset many privacy ...

User comments : 0