TSMC Verifies Fully Functional 90 Nanometer Chips Using Immersion Lithography Tools

Dec 22, 2004

Findings Suggests Immersion is Nearly Ready For Production

Taiwan Semiconductor Manufacturing Company, said that it used immersion lithography tools to produce fully functional 90nm devices. The finding was presented in a keynote speech at the Cymer Lithography Symposium in Semicon Japan on December 1, predating a similar announcement.
TSMC's circuits represent the first data that immersion-based lithography systems are nearing production-ready status.

Dr. Burn J. Lin, senior director of TSMC's micropatterning division, reported in the December keynote speech that TSMC had fabricated electrically functioning 90nm SRAM chips using a 90nm-node-capable prototype immersion scanner from ASML. The wafer batch was split at ASML for both immersion and dry exposures at critical layer before metal. After developing the resist image, the wafers were sent back to TSMC to complete the fabrication steps.

Yield, device characteristics and defect levels were comparable for both dry and wet scanners. The yield-related depth of focus of the immersion scanner is almost twice that of the dry scanner.

"While some optimization may still be in order, we have promising results pointing to immersion lithography systems and tools capable of producing functional deep-submicron devices that will scale well below the 90nm node," said Dr. Lin. "The larger focal range is the most significant finding, because it suggests that immersion tools can safely image with better yield than previously anticipated. This finding can be extrapolated to infer even greater benefits at the 65nm node."

TSMC estimates that immersion lithography tools may be called upon for 65nm production and are the chosen candidates for 45nm production. TSMC began installing its first 65nm immersion lithography system in early November this year.


Explore further: BlackBerry courts iPhone users with cash

add to favorites email to friend print save as pdf

Related Stories

IMEC reports major progress in EUV

Jul 14, 2008

IMEC reports functional 0.186µm2 32nm SRAM cells made with FinFETs from which the contact layer was successfully printed using ASML’s full field extreme ultraviolet (EUV) Alpha Demo Tool (ADT). Applied ...

IMEC advancing state-of-the-art in FinFETs

Jun 13, 2007

At this week’s VLSI Symposium, IMEC presents significant progress in the manufacturability, circuit performance and reliability of FinFETs. The results advance FinFET process technology towards being a candidate ...

Hynix joins IMEC's (sub-)32nm CMOS research platform

May 24, 2007

Hynix Semiconductor has entered into a strategic partnership with IMEC, Europe’s leading independent nanoelectronics research center, to perform research and development for the (sub)-32nm memory process generations.

Improved Materials Dominate Chip Evolution

Nov 03, 2005

Material innovation has replaced scaling as the primary source of performance and feature improvements in leading-edge CMOS semiconductors, IBM technologist Paul Farrar, Jr. told attendees at the ISMI Symposium on Manufacturing ...

Recommended for you

Enabling the hearing impaired to locate human speakers

3 minutes ago

New wireless microphones systems developed at EPFL should allow the hearing impaired to aurally identify, even with closed eyes, the location of the person speaking. This new technology will be used in classrooms ...

ENIAC panels go on display at Oklahoma museum

1 hour ago

We keep up with history of events through the calendar, marking special days: Amelia Earhart's birthday, the collapse of the Berlin Wall; the assassination of JFK. Another path is through narrative. An eye-catcher ...

BlackBerry courts iPhone users with cash

12 hours ago

Canadian smartphone maker BlackBerry is wooing Apple customers with a cash offer for trade-ins of iPhones for its new square-screened, keyboard-equipped Passport.

HP earnings show continued struggle

13 hours ago

Venerable tech giant Hewlett-Packard has been struggling for three years to turn its business around. Its latest earnings show it still has more work ahead.

UN moves to strengthen digital privacy (Update)

13 hours ago

The United Nations on Tuesday adopted a resolution on protecting digital privacy that for the first time urged governments to offer redress to citizens targeted by mass surveillance.

User comments : 0

Please sign in to add a comment. Registration is free, and takes less than a minute. Read more

Click here to reset your password.
Sign in to get notified via email when new comments are made.