Epson, Fujitsu Announce Results of Joint Project to Develop Next-Generation FRAM Technology

January 29, 2007

Seiko Epson and Fujitsu today announced the results of their joint project to develop next-generation Ferrorelectric Random Access Memory (FRAM) technology.

Since announcing a joint development agreement in June 2005, Epson and Fujitsu have collaborated on development of next-generation technology for FRAM non-volatile memory. The joint development project was successfully completed recently and produced the anticipated results.

Through the project, the two companies developed technology for forming, processing and evaluating a new ferroelectric (PZT) film and created FRAM memory core process technology that is highly integrated (four times the level of conventional FRAM), features high performance (read/write speeds over three times faster than conventional FRAM) and boasts outstanding reliability (capable of more than one hundred trillion read/write cycles).

FRAM is currently attracting attention as a cutting-edge technology for secure memory, and this level of performance is a world first. Since the ferroelectric process can be added to existing CMOS logic processes, it will be suitable for the development of mass production technologies.

Epson intends to combine the results of this joint project with its own low power consumption CMOS technology to further speed up development and commercialization of integrated large-scale integrated circuits (LSIs) for applications such as battery-operated and portable devices.

Fujitsu will proceed with development of mass production technologies based on the results of this joint project. In addition to leveraging FRAM's advantages of low power consumption and high read/write speeds in the security applications market for which FRAM is suited for, Fujitsu will create new markets for embedded FRAM microcontrollers and accommodate diverse customer needs.

Source: Fujitsu

Explore further: Fujitsu Semiconductor launches world's largest density 4 Mbit ReRAM product for mass production

Related Stories

ESA-NASA collaboration furthers sea-ice research

April 20, 2011

A carefully executed operation to validate data from CryoSat has shown what can be accomplished when ESA, NASA and others join forces to further our understanding of how the fragile polar environment is responding to climate ...

ESA Arctic ice campaign takes off

April 11, 2011

To guarantee ESA's CryoSat mission is delivering the best data possible, scientists have set out on a major expedition to the Arctic – part of a collaborative effort between ESA and NASA to gather ice measurements as ...

Recommended for you

Swiss unveil stratospheric solar plane

December 7, 2016

Just months after two Swiss pilots completed a historic round-the-world trip in a Sun-powered plane, another Swiss adventurer on Wednesday unveiled a solar plane aimed at reaching the stratosphere.

Solar panels repay their energy 'debt': study

December 6, 2016

The climate-friendly electricity generated by solar panels in the past 40 years has all but cancelled out the polluting energy used to produce them, a study said Tuesday.

0 comments

Please sign in to add a comment. Registration is free, and takes less than a minute. Read more

Click here to reset your password.
Sign in to get notified via email when new comments are made.