UMC Enhances 90-nm Manufacturability Using Synopsys' Phase Shift Technology

Jan 04, 2005

Synopsys, Inc., a world leader in semiconductor design software, and UMC a world leading semiconductor foundry, today announced that UMC is using Synopsys' alternating aperture phase-shift mask (AA-PSM) technology to enhance manufacturability for its 90-nanometer (nm) process. Manufacturability improvements are obtained through increased lithography resolution, a larger process window, and better performance enabled by the AA-PSM technology. UMC can now deliver the benefits of AA-PSM to those customers developing high-performance and low-power integrated circuits on 90-nm technology.

"UMC constantly develops and employs new production techniques to maintain its position as a manufacturing efficiency leader," said Peter Huang, deputy director of the Central Research and Development Advanced Module division at UMC. "We are delighted to see the positive results of our AA-PSM efforts with Synopsys for our mainstream 90 nanometer process. This success not only enhances our current production, but also demonstrates the viability of this solution for future process generations below 90 nanometers. Technologies now under industry development, such as immersion lithography, have yet to be proven in a real-life manufacturing environment, while AA-PSM has already been validated in our fab with production silicon."

UMC and Synopsys engineers worked together to retarget an FPGA chip to the AA-PSM process using Synopsys' DFM flow. The flow consisted of Proteus optical proximity correction (OPC) software, Synopsys' AA-PSM technology, SiVL lithography verification software, HerculesTM design rule check (DRC) and mask rule check (MRC) tools, and CATS fracturing software. Synopsys' AA-PSM technology is the only commercially available strong phase-shifting technology currently used by several leading edge semiconductor companies in IC production.

"Synopsys is committed to delivering technology and software products that help semiconductor companies accelerate their production yield ramps on advanced process nodes," said Edmund Cheng, vice president of Marketing, Silicon Engineering group at Synopsys. "We are very pleased to collaborate with UMC in applying the unique capabilities of Synopsys' AA-PSM technology to improve lithography resolution. This successful outcome further validates Synopsys' leadership position in providing a comprehensive DFM solution for high-yield designs at 90-nm and below."

Explore further: Solar Impulse 2 pilot becomes aviation legend

Related Stories

Solar Impulse 2 pilot becomes aviation legend

2 hours ago

At 62 years of age, Swiss Solar Impulse 2 pilot Andre Borschberg has made aviation history with a record breaking solo flight across the Pacific that he has called "an interior journey".

Facegloria: Facebook for Brazil's Evangelicals

2 hours ago

Fluffy clouds waft across a blue sky as you log in and while you chat with friends, Gospel music rings out: welcome to Facegloria, the social network for Brazilian Evangelicals.

Mexico City proposes regulations for Uber

2 hours ago

Mexico City is proposing regulations that would allow Uber and other smartphone-based ride-sharing apps to operate, while requiring drivers and cars to be registered, the city's Office of Legal and Legislative Studies said ...

Researchers discover new mechanism of DNA repair

16 hours ago

The DNA molecule is chemically unstable giving rise to DNA lesions of different nature. That is why DNA damage detection, signaling and repair, collectively known as the DNA damage response, are needed.

Recommended for you

Solar Impulse 2 pilot becomes aviation legend

Jul 04, 2015

At 62 years of age, Swiss Solar Impulse 2 pilot Andre Borschberg has made aviation history with a record breaking solo flight across the Pacific that he has called "an interior journey".

Facegloria: Facebook for Brazil's Evangelicals

Jul 04, 2015

Fluffy clouds waft across a blue sky as you log in and while you chat with friends, Gospel music rings out: welcome to Facegloria, the social network for Brazilian Evangelicals.

Mexico City proposes regulations for Uber

Jul 04, 2015

Mexico City is proposing regulations that would allow Uber and other smartphone-based ride-sharing apps to operate, while requiring drivers and cars to be registered, the city's Office of Legal and Legislative Studies said ...

User comments : 0

Please sign in to add a comment. Registration is free, and takes less than a minute. Read more

Click here to reset your password.
Sign in to get notified via email when new comments are made.