UV Nanoimprint

December 6, 2004
UV Nanoimprint

The german WDR (Westdeutscher Rundfunk) has reported in its science magazin Q21 about the fabrication of nano sized structures by UV Nanoimprint. The technology is decriped on the example of a miniaturized page of Gutenbergs Bibel which has been fabrictated in AMO (AMICA).

The story in german can be found on the webpage of Q21.

UV Nanoimprint is a low cost fabrication technology for nanoelectronic and photonic devices with dimensions far below 100 nm. AMO develops process technology and optimizes the tool platform since several year aiming for the comercialisation of this next generation lithography technology.

About UV Nanoimprint:

Nanoimprint lithography (NIL) has received considerable interests in the last few years for fulfilling the demands of low cost and high resolution nano lithographic technique. Conventional NIL processes, however, coined as stamp and step processes require thermal cycles between 140°C and 180°C and high pressures during the hot embossing procedure. Thermal and mechanical loads involved in these processes represent a nearly prohibitive burden for fast and high precision alignment. The mechanical masses to be moved in high throughput equipment require a large degree of complex mechanical handling.

A new UV based nanoimprint lithography (UV-NIL) has been developed and demonstrated at AMO as attractive alternative to the hot embossing technique. The low pressure (<1bar) as well as the absence of any thermal cycles appears very attractive for high precision printing down to 10 nm and relaxes the technical requirements for placement accuracy and pattern fidelity to a large extent. In addition the UV based curing opens the way to “step&repeat” modes in this lithographic process, which are necessary for processing on the wafer scale.

Just recently Nanoimprint has been included in the International Technology Roadmap for Semiconductors (ITRS 2003 Edition)

See also our dedicated UV Nanoimprint webpage.

Explore further: Oxide layer boosts performance in nanowire quantum dot solar cells

Related Stories

Ultrathin lens could revolutionise next-gen devices

September 23, 2015

Researchers at Swinburne University of Technology, collaborating with Monash University, have developed an ultrathin, flat, ultra-lightweight graphene oxide optical lens with unprecedented flexibility.

A fast cell sorter shrinks to cell phone size

September 22, 2015

Commercial fluorescence activated cell sorters have been highly successful in the past 40 years at rapidly and accurately aiding medical diagnosis and biological studies, but they are bulky and too expensive ($200,000 -$1,000,000) ...

First circularly polarized light detector on a silicon chip

September 22, 2015

Invention of the first integrated circularly polarized light detector on a silicon chip opens the door for development of small, portable sensors that could expand the use of polarized light for drug screening, surveillance, ...

Recommended for you

48-million-year-old horse-like fetus discovered in Germany

October 7, 2015

A 48 million year-old horse-like equoid fetus has been discovered at the Messel pit near Frankfurt, Germany according to a study published October 7, 2015 in the open-access journal PLOS ONE by Jens Lorenz Franzen from Senckenberg ...

A village of bacteria to help frogs fight disease

October 7, 2015

The naturally occurring bacteria on a frog's skin could be the most important tool for helping the animal fight off a deadly skin disease, according to an experiment conducted by Virginia Tech researchers.


Please sign in to add a comment. Registration is free, and takes less than a minute. Read more

Click here to reset your password.
Sign in to get notified via email when new comments are made.